Table 1 lists a wide range of spectroscopic techniques with details on the type of information that these techniques can provide, their sampling depth, their sensitivity, and their major limitations. Some key references are provided for each technique. The techniques are classified in five major categories: ion spectroscopies, electron spectroscopies, x-ray spectroscopies, vibrational spectroscopies, and miscellaneous techniques. This distinction is, of course, arbitrary and is based on the type of signal that is recorded in each technique. It would be equally justifiable to classify the techniques on the basis of the primary beam or excitation source or even on sampling depth [3]. However, in each group a distinction has been made between those techniques that are well known and currently widely used and techniques that are either variations of the major techniques or still in a developmental stage. The techniques that are closely related or that are variations of the same main technique are grouped together.
Another way of comparing techniques is to group them according to the combination of excitation (i. e., signal in) and response (i. e., signal out). This is frequently done in the literature [4]. This has been done here for a number of the techniques listed in Table 1. The results are shown in Table 2, which illustrates that a technique has been developed or proposed for almost all combinations of ions, electrons, and photons.
Table 1 indicates that the sampling depth for the various techniques varies from 1 monolayer to several millimeters. In general, the ion-based techniques, for instance SIMS and ISS, have the lowest sampling depths because the mean free path of ions in solids is not more than one or two monolayers. The penetration and escape depths for photons are much higher and, therefore, the techniques that are based on the detection of electromagnetic radiation, such as FTIR and XRF, give information on microns in metals and even millimeters in organics. This does not mean, however, that these techniques cannot detect monolayers. In suitable samples, both FTIR techniques and XRF can detect monolayers with high sensitivity, but it is difficult to restrict the signal acquisition to the monolayer only because of the larger sampling depths.
Methods based on electron detection have intermediate sampling depths. The sampled thickness in techniques such as AES and XPS is of the order of 50 A. Since the escape depth of an electron is dependent on its energy, the sampling depth in XPS and
Table 1 Spectroscopic Techniques for Use in Adhesive Bonding Studies
angular distribution |
(continued )
Technique |
Acronym |
Sampling depth |
Information |
Sensitivity |
Principle |
Limitation |
Ref. |
Single photon ionization |
SPI |
As SIMS |
Mostly as |
Lower than SIMS |
Postionization |
Lower |
12 |
Surface analysis by resonance |
SARISA |
SIMS; more |
of sputtered |
sensitivity |
|||
ionization of sputtered atoms |
quantitative |
neutrals |
than SIMS |
||||
Resonantly enhanced multiphoton |
REMPI |
||||||
ionization |
|||||||
Non-resonant multiphoton ionization |
NRMPI |
||||||
spectroscopy |
|||||||
Hydrogen forward scattering |
HFS |
1-5 pm |
H detection |
H+, 4He+ |
H only |
103 |
|
spectroscopy |
beams |
||||||
Forward recoil scattering |
FRS |
133 |
|||||
spectroscopy |
|||||||
B. Electron spectroscopies |
|||||||
Auger electron spectroscopy |
AES |
10-50 A; |
Elements; >He; |
0.1 at. -% |
e~ beam |
UHV; |
14, 18 |
Scanning Auger microscopy |
SAM |
to 1 pm |
depth profiles |
excitation; |
conductors |
||
X-ray induced Auger electron |
XAES |
in depth |
e~ detection |
only; limited |
|||
spectroscopy |
profiling; |
chemical info |
|||||
Ion-induced Auger electron |
IIAES |
mapping |
8 |
||||
spectroscopy |
|||||||
Ion neutralization spectroscopy |
INS |
112 |
|||||
Appearance potential spectroscopy |
APS |
113, 131 |
|||||
X-ray photoelectron spectroscopy |
XPS |
As in AES; |
|||||
Electron spectroscopy for chemical |
ESCA |
UPS lower |
Elements; >H; |
0.1 at. -% |
hv excitation; |
UHV; mapping |
14, 114 |
analysis |
binding states |
e~ detection |
limited; low |
||||
UV photoelectron spectroscopy |
UPS |
sensitivity |
|||||
Angular-resolved UV photoelectron |
ARUPS, |
115 |
|||||
spectroscopy |
ARPES |
Inverse photoemission spectroscopy Bremsstrahlung isochromat spectroscopy |
IPES BIS |
17 |
|||||
Electron energy loss spectroscopy |
EELS |
50 A |
All elements |
0.1 at. -% |
e excitation in |
Low sensitivity |
17 |
Scanning low energy electron |
SLEELM |
SEM/TEM |
116, 117 |
||||
energy loss microscopy |
|||||||
Ionization low spectroscopy |
ILS |
118, 132 |
|||||
C. X-ray spectroscopies |
|||||||
Energy-dispersive x-ray analysis |
EDXA |
1 pm |
Elements; >B |
0.01 at. -% |
e~ beam; hv |
No chemical |
119 |
Wavelength dispersive x-ray |
WDXA |
PIXE less |
detection |
info; not |
|||
analysis |
surface |
||||||
Electron probe microanalysis |
EPMA |
sensitive |
|||||
Particle-induced x-ray emission |
PIXE |
120 |
|||||
Extended x-ray fine structure |
EXAFS |
varies |
Chemical states |
Low |
Oscill. in x-ray |
Slow; |
121, 122 |
spectroscopy |
spectra |
synchrotron |
|||||
Surface extended x-ray fine |
SEXAFS |
||||||
structure spectroscopy |
|||||||
Near-edge x-ray absorption fine |
NEXAFS |
||||||
structure |
|||||||
X-ray absorption near edge structure |
XANES |
||||||
X-ray fluorescence |
XRF |
10 pm |
Elements |
0.001 at. -% |
hv excitation |
No chemical |
— |
and |
info; no |
||||||
detection |
mapping |
||||||
X-ray diffraction |
XRD |
10 pm |
Crystal structure |
Low |
X-rays |
Crystalline only |
— |
D. Vibrational spectroscopies |
|||||||
Fourier transform infrared |
FTIR |
10 pm |
Molecules, |
Low |
Excitation of |
Mainly |
38, 40, |
spectroscopy |
functional |
bonds by hv |
qualitative |
124 |
|||
Diffuse-reflectance infrared Fourier |
DRIFT |
groups |
|||||
transform spectroscopy |
(continued ) |
Sampling
Acronym depth Information Sensitivity Principle Limiatation Ref.
Attenuated total reflection ATR
spectroscopy
Reflection-absorption infrared RAIR
spectroscopy
Multiple reflection absorption MRAIR
infrared spectroscopy
Grazing incidence reflection GIR(S)
(spectroscopy)
Multiple reflection infrared MRS
spectroscopy
Multiple internal reflection MIR
(spectroscopy)
External reflection spectroscopy ERS
Surface reflectance infrared SRIRS
spectroscopy
Photoacoustic spectroscopy PAS
Emission spectroscopy EMS
Photothermal beam deflection PBDS
spectroscopy
Internal reflection spectroscopy IRS
Raman spectroscopy |
RS |
10 pm; 50 A Bonds and |
Low |
Scattered |
Low sensitivity; |
36, 62, |
Laser Raman spectroscopy |
LRS |
in SERS molecules |
photons |
qualitative |
70 |
|
Fourier transform Raman spectroscopy |
FTRS |
|||||
Hadamer transform Raman spectroscopy |
HTRS |
|||||
Surface-enhanced Raman spectroscopy |
SERS |
|||||
Resonance Raman spectroscopy |
RRS |
High-resolution electron energy loss spectroscopy |
HREELS |
50 At |
Molecular vibrations |
e excitation |
Low resolution |
37 |
|
Inelastic electron tunneling spectroscopy |
IETS |
1 monolayer |
Molecular vibrations |
Low |
Excitation by voltage |
Sample preparation |
125 |
Ellipsometry |
— |
— |
Film thickness |
— |
Polarized light |
Sample transparent |
88, 91 |
Bombardment-induced light emission |
BLE |
126, 127 |
|||||
Glow-discharge optical spectroscopy |
GDOS |
> 10 pm |
Depth profile of elements |
High |
Sputtering by Ar+ ions |
Quantitative |
99, 100 |
E. Other techniques Low-energy electron diffraction Elastic low-energy electron diffraction Inelastic low-energy electron diffraction Reflection high-energy electron diffraction |
LEED ELEED ILEED RHEED |
50 A |
Crystalline surface structure |
Limited applicability |
128, 129, 130 |
||
Mossbauer spectroscopy |
MS |
High |
Chemical |
Low |
Absorption of |
Limited no. of |
134 |
Nuclear magnetic resonance Electron spin resonance |
NMR ESR |
Bulk samples |
environment of atom (e. g., Fe) Chemical state and free |
High |
g-rays by nucleus Resonance in magnetic |
elements No surface info |
— |
Surface composition analysis by neutral and ion impact radiation |
SCANIIR |
spins |
fields |
8 |
|||
Electrochemical impedance spectroscopy |
EIS |
Impedance of coated metal |
Modeling |
95, 96 |
Copyright © 2003 by Taylor & Francis Group, LLC
Table 2 Principles of Some Spectroscopic Techniques Signal
|
AES is not the same for all elements detected in the sample. Further, by varying the angle between the sample surface and analyzer, the sampling depth can be varied, resulting in a nondestructive quantitative concentration depth profile in the range 5-50 A. This feature is especially useful in XPS.
The type of information provided by the techniques listed in the tables also varies greatly. Many spectroscopic techniques give qualitative and/or quantitative elemental composition. The vibrational techniques, however, generally provide information on the molecular structure. SIMS, especially in the static mode (SSIMS or TOFSIMS), can yield information on molecular structures and even orientation of monolayers [5-10]. This is particularly useful for the study of the absorption of coupling agents on metals or to determine the effects of plasma treatments on polymer surfaces [11]. TOFSIMS instruments also have capabilities for determining the two-dimensional distributions of elements or molecular species at the surface, similar to the capabilities (for elements only) offered by AES and EDXA or WDXA.
The major technique for determining a depth profile of elemental compositions is AES. A newer technique for this purpose is SNMS, which has a better interface resolution (due to a lower sampling depth) than AES and a better sensitivity for many elements than AES [10,12,13]. In SNMS the neutrals emitted in the SIMS process are ionized and then mass-analyzed. The emission of neutrals is much less matrix-dependent than the emission of positive or negative ions detected in regular SIMS. Depth profiling can also be done in regular SIMS (the so-called dynamic SIMS version), but this technique then requires extensive calibration of sputtering rates and elemental sensitivities. Depth profiling in both AES and SIMS techniques is done by sputtering, usually by means of a beam of Ar+ ions.
The limitations of some of the more popular techniques are also given in Table 1. For many techniques, especially the more surface-sensitive ones (ion — and electron-based methods), an ultrahigh vacuum (UHV) environment is required. This requirement, of course, increases the cost of the equipment, but it also reduces the flexibility and applicability of the technique. Other limitations of certain techniques as indicated in the table are the difficult or complex sample preparation procedures, low sensitivity (long acquisition times), and poor resolution or element selectivity (e. g., ISS). Another limitation of some of the more sophisticated techniques is that they are not commercially available. To carry out certain techniques, it may be necessary to modify commercial instruments.