Self-cross-linking (epoxy homopolymerization)

In the presence of a suitable catalyst, epoxy groups can undergo self­polymerization to generate a polyether through either a cationic or anionic mechanism. Anionic polymerization occurs in the presence of tertiary amines (Lewis bases) such as tris(dimethylaminomethyl) phenol, benzyldimethylamine or imidazole derivatives, while cationic polymerization can occur in the presence of Lewis acids. Boron trifluoride (BF3) or superacids such as triflic acid (F3CSO3H), hexafluoroantimonic acid (HSbF6) or hexafluoroarsenic acid (HAsF6) are frequently used for cationic polymerization of epoxy resins. Photolatent superacids, also known as photoacid generators, are frequently used in cationically cured UV epoxy resin curing systems.

Комментирование и размещение ссылок запрещено.

Комментарии закрыты.